SiGe HBT performance and reliability trends through f/sub T/ of 350 GHz

We discuss the SiGe HBT structural changes required for very high performance. The increase in collector concentration, affecting current density and avalanche current, appears to be the most fundamental concern for reliability. In device design, a narrow emitter and reduced poly-single-crystal interfacial oxide are important elements in minimizing device parameter shifts. From the application point of view, avalanche hot-carriers appear to present new constraints, which may be managed through limiting voltage (to 1.5/spl times/-2/spl times/ BV/sub CEO/), or through circuit designs robust to base current parameter shifts.

[1]  E. Johnson Physical limitations on frequency and power parameters of transistors , 1965 .

[2]  C. Kaya,et al.  Reliability analysis of self-aligned bipolar transistor under forward active current stress , 1986, 1986 International Electron Devices Meeting.

[3]  R. A. Wachnik,et al.  Degradation of bipolar transistors under high current stress at 300 K , 1988 .

[4]  E. Hackbarth,et al.  On the very-high-current degradations on Si n-p-n transistors , 1990 .

[5]  J. Zhao,et al.  Resolving the mechanisms of current gain increase under forward current stress in poly emitter n-p-n transistors , 1993, IEEE Electron Device Letters.

[6]  Hirohiko Sugahara,et al.  Improved reliability of AlGaAs/GaAs heterojunction bipolar transistors with a strain-relaxed base , 1993, 15th Annual GaAs IC Symposium.

[7]  C. C. McAndrew,et al.  Improved circuit technique to reduce h/sub fe/ degradation in bipolar output drivers , 1995 .

[8]  T. Henderson,et al.  Model for degradation of GaAs/AlGaAs HBTs under temperature and current stress , 1995, Proceedings of International Electron Devices Meeting.

[9]  Y. Tamaki,et al.  Hetero-emitter-like characteristics of phosphorus doped polysilicon emitter transistors. Part I: band structure in the polysilicon emitter obtained from electrical measurements , 1995 .

[10]  Chih-Tang Sah,et al.  Degradation of bipolar transistor current gain by hot holes during reverse emitter-base bias stress , 1996 .

[11]  Chih-Tang Sah,et al.  Degradation of silicon bipolar junction transistors at high forward current densities , 1997 .

[12]  J. W. Slotboom,et al.  High-performance SiSiGe HBTs SiGe-technology development in Esprit Project 8001 TIBIA: An overview , 1997 .

[13]  K. Washio,et al.  A selective-epitaxial SiGe HBT with SMI electrodes featuring 9.3-ps ECL-gate delay , 1997, International Electron Devices Meeting. IEDM Technical Digest.

[14]  Alain Chantre,et al.  A high-speed low 1/f noise SiGe HBT technology using epitaxially-aligned polysilicon emitters , 1999 .

[15]  S. Thomas,et al.  Reliability and failure criteria for AlInAs/GaInAs/InP HBTs , 2000, Conference Proceedings. 2000 International Conference on Indium Phosphide and Related Materials (Cat. No.00CH37107).

[16]  B. Jagannathan,et al.  A 0.18 /spl mu/m BiCMOS technology featuring 120/100 GHz (f/sub T//f/sub max/) HBT and ASIC-compatible CMOS using copper interconnect , 2001, Proceedings of the 2001 BIPOLAR/BiCMOS Circuits and Technology Meeting (Cat. No.01CH37212).

[17]  Hans-Martin Rein,et al.  Influence of impact-ionization-induced instabilities on the maximum usable output voltage of Si-bipolar transistors , 2001 .

[18]  M. Racanelli,et al.  0.18 /spl mu/m SiGe BiCMOS technology for wireless and 40 Gb/s communication products , 2001, Proceedings of the 2001 BIPOLAR/BiCMOS Circuits and Technology Meeting (Cat. No.01CH37212).

[19]  S. Jeng,et al.  Self-aligned SiGe NPN transistors with 285 GHz f/sub MAX/ and 207 GHz f/sub T/ in a manufacturable technology , 2002, IEEE Electron Device Letters.

[20]  Alvin J. Joseph,et al.  Wafer level forward current reliability analysis of 120GHz production SiGe HBTs under accelerated current stress , 2002, 2002 IEEE International Reliability Physics Symposium. Proceedings. 40th Annual (Cat. No.02CH37320).

[21]  D. Knoll,et al.  Novel collector design for high-speed SiGe:C HBTs , 2002, Digest. International Electron Devices Meeting,.

[22]  K. Washio,et al.  190-GHz f/sub T/, 130-GHz f/sub max/ SiGe HBTs with heavily doped base formed by HCl-free selective epitaxy , 2002, Proceedings of the Bipolar/BiCMOS Circuits and Technology Meeting.

[23]  S. Jeng,et al.  SiGe HBTs with cut-off frequency of 350 GHz , 2002, Digest. International Electron Devices Meeting,.

[24]  J. Rieh,et al.  Structural dependence of the thermal resistance of trench-isolated bipolar transistors , 2002, Proceedings of the Bipolar/BiCMOS Circuits and Technology Meeting.

[25]  B. Jagannathan,et al.  Noise performance of a low base resistance 200 GHz SiGe technology , 2002, Digest. International Electron Devices Meeting,.

[26]  A new "mixed-mode" base current degradation mechanism in bipolar transistors , 2002, Proceedings of the Bipolar/BiCMOS Circuits and Technology Meeting.

[27]  Gregory G. Freeman,et al.  Avalanche current induced hot carrier degradation in 200 GHz SiGe heterojunction bipolar transistors , 2003, 2003 IEEE International Reliability Physics Symposium Proceedings, 2003. 41st Annual..