SiGe HBT performance and reliability trends through f/sub T/ of 350 GHz
暂无分享,去创建一个
Alvin J. Joseph | Basanth Jagannathan | Jae-Sung Rieh | David C. Ahlgren | Gregory G. Freeman | Fernando Guarin | B. Jagannathan | J. Rieh | D. Ahlgren | G. Freeman | A. Joseph | F. Guarín | Zhijian Yang | Zhijian Yang
[1] E. Johnson. Physical limitations on frequency and power parameters of transistors , 1965 .
[2] C. Kaya,et al. Reliability analysis of self-aligned bipolar transistor under forward active current stress , 1986, 1986 International Electron Devices Meeting.
[3] R. A. Wachnik,et al. Degradation of bipolar transistors under high current stress at 300 K , 1988 .
[4] E. Hackbarth,et al. On the very-high-current degradations on Si n-p-n transistors , 1990 .
[5] J. Zhao,et al. Resolving the mechanisms of current gain increase under forward current stress in poly emitter n-p-n transistors , 1993, IEEE Electron Device Letters.
[6] Hirohiko Sugahara,et al. Improved reliability of AlGaAs/GaAs heterojunction bipolar transistors with a strain-relaxed base , 1993, 15th Annual GaAs IC Symposium.
[7] C. C. McAndrew,et al. Improved circuit technique to reduce h/sub fe/ degradation in bipolar output drivers , 1995 .
[8] T. Henderson,et al. Model for degradation of GaAs/AlGaAs HBTs under temperature and current stress , 1995, Proceedings of International Electron Devices Meeting.
[9] Y. Tamaki,et al. Hetero-emitter-like characteristics of phosphorus doped polysilicon emitter transistors. Part I: band structure in the polysilicon emitter obtained from electrical measurements , 1995 .
[10] Chih-Tang Sah,et al. Degradation of bipolar transistor current gain by hot holes during reverse emitter-base bias stress , 1996 .
[11] Chih-Tang Sah,et al. Degradation of silicon bipolar junction transistors at high forward current densities , 1997 .
[12] J. W. Slotboom,et al. High-performance SiSiGe HBTs SiGe-technology development in Esprit Project 8001 TIBIA: An overview , 1997 .
[13] K. Washio,et al. A selective-epitaxial SiGe HBT with SMI electrodes featuring 9.3-ps ECL-gate delay , 1997, International Electron Devices Meeting. IEDM Technical Digest.
[14] Alain Chantre,et al. A high-speed low 1/f noise SiGe HBT technology using epitaxially-aligned polysilicon emitters , 1999 .
[15] S. Thomas,et al. Reliability and failure criteria for AlInAs/GaInAs/InP HBTs , 2000, Conference Proceedings. 2000 International Conference on Indium Phosphide and Related Materials (Cat. No.00CH37107).
[16] B. Jagannathan,et al. A 0.18 /spl mu/m BiCMOS technology featuring 120/100 GHz (f/sub T//f/sub max/) HBT and ASIC-compatible CMOS using copper interconnect , 2001, Proceedings of the 2001 BIPOLAR/BiCMOS Circuits and Technology Meeting (Cat. No.01CH37212).
[17] Hans-Martin Rein,et al. Influence of impact-ionization-induced instabilities on the maximum usable output voltage of Si-bipolar transistors , 2001 .
[18] M. Racanelli,et al. 0.18 /spl mu/m SiGe BiCMOS technology for wireless and 40 Gb/s communication products , 2001, Proceedings of the 2001 BIPOLAR/BiCMOS Circuits and Technology Meeting (Cat. No.01CH37212).
[19] S. Jeng,et al. Self-aligned SiGe NPN transistors with 285 GHz f/sub MAX/ and 207 GHz f/sub T/ in a manufacturable technology , 2002, IEEE Electron Device Letters.
[20] Alvin J. Joseph,et al. Wafer level forward current reliability analysis of 120GHz production SiGe HBTs under accelerated current stress , 2002, 2002 IEEE International Reliability Physics Symposium. Proceedings. 40th Annual (Cat. No.02CH37320).
[21] D. Knoll,et al. Novel collector design for high-speed SiGe:C HBTs , 2002, Digest. International Electron Devices Meeting,.
[22] K. Washio,et al. 190-GHz f/sub T/, 130-GHz f/sub max/ SiGe HBTs with heavily doped base formed by HCl-free selective epitaxy , 2002, Proceedings of the Bipolar/BiCMOS Circuits and Technology Meeting.
[23] S. Jeng,et al. SiGe HBTs with cut-off frequency of 350 GHz , 2002, Digest. International Electron Devices Meeting,.
[24] J. Rieh,et al. Structural dependence of the thermal resistance of trench-isolated bipolar transistors , 2002, Proceedings of the Bipolar/BiCMOS Circuits and Technology Meeting.
[25] B. Jagannathan,et al. Noise performance of a low base resistance 200 GHz SiGe technology , 2002, Digest. International Electron Devices Meeting,.
[26] A new "mixed-mode" base current degradation mechanism in bipolar transistors , 2002, Proceedings of the Bipolar/BiCMOS Circuits and Technology Meeting.
[27] Gregory G. Freeman,et al. Avalanche current induced hot carrier degradation in 200 GHz SiGe heterojunction bipolar transistors , 2003, 2003 IEEE International Reliability Physics Symposium Proceedings, 2003. 41st Annual..