Effect of Plasma Exposure on the Chemistry and Morphology of Aerosol‐Assisted, Plasma‐Deposited Coatings

This study reports on the effect on the morphology and chemistry of atmospheric pressure plasma deposited nm-thick coatings (21 � 3 nm) as the level of exposure to the plasma is systematically altered. Coatings were deposited by directly injecting hexamethyldisiloxane, polydimethylsiloxane or tetramethyldisiloxane liquid precursors through a nebulizer into a helium/oxygen atmospheric pressure plasma. An increase in the level of the precursor was found to be associated with a decrease in the concentration of methyl functional groups in the coating and to an increase of the Si–O crosslinking, as demonstrated using surface energy and XPS analysis. This resulted in an increase in the coating refractive index, and in a reduction of the number of surface particulates, as well as of surface roughness.

[1]  Mahfujur Rahman,et al.  Thermal stability studies of atmospheric plasma deposited siloxane films deposited on Vycor™ glass , 2008 .

[2]  M. Alexander,et al.  A methodology for curve‐fitting of the XPS Si 2p core level from thin siloxane coatings , 2007 .

[3]  C. Riccardi,et al.  Characterisation of SiOxCyHz thin films deposited by low temperature PECVD , 2007 .

[4]  B. Twomey,et al.  Properties of Siloxane Coatings Deposited in a Reel-to-Reel Atmospheric Pressure Plasma System , 2007 .

[5]  N. Lee,et al.  Effect of N2O/SiH4 flow ratio on properties of SiOx thin films deposited by low-temperature remote plasma-enhanced chemical deposition , 2007 .

[6]  N. Tomozeiu Effects of UV photon irradiation on SiOx (0 < x < 2) structural properties , 2006 .

[7]  K. Lang,et al.  Characterization of SiO2 thin films prepared by plasma-activated chemical vapour deposition , 2006 .

[8]  Ulrich Schmid,et al.  Enhanced stability of Ti/Pt micro-heaters using a-SiC:H passivation layers , 2006 .

[9]  L. O'Neill,et al.  Atmospheric Pressure Plasma Liquid Deposition – A Novel Route to Barrier Coatings , 2005 .

[10]  L. Simonchik,et al.  Influence of the nitrogen–helium mixture ratio on parameters of a self-sustained normal dc atmospheric pressure glow discharge , 2005 .

[11]  William G. Graham,et al.  Characterization of a dielectric barrier discharge operating in an open reactor with flowing helium , 2004 .

[12]  T. Belmonte,et al.  OES and FTIR diagnostics of HMDSO/O2 gas mixtures for SiOx deposition assisted by RF plasma , 2004 .

[13]  B. Parbhoo,et al.  Development of a methodology for XPS curve‐fitting of the Si 2p core level of siloxane materials , 2004 .

[14]  M. Sanden,et al.  Ellipsometric characterization of expanding thermal plasma deposited SiO2-like films , 2003 .

[15]  J. Badyal,et al.  Atmospheric pressure glow discharge deposition of polysiloxane and SiOx films , 2003 .

[16]  K. V. Kozlov,et al.  Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure—A Comparison , 2001 .

[17]  P. Favia,et al.  Process control for plasma processing of polymers , 2001 .

[18]  Z. Rymuza,et al.  Thin Films Deposition from Hexamethyldisiloxane and Hexamethyldisilazane under Dielectric-Barrier Discharge (DBD) Conditions , 2000 .

[19]  N. Gherardi,et al.  A new approach to SiO2 deposit using a N2-SiH4-N2O glow dielectric barrier-controlled discharge at atmospheric pressure , 2000 .

[20]  H. Nishino,et al.  Density measurement of thin glass layers for gas barrier films , 1999 .

[21]  H. Yasuda,et al.  Surface Modification of Conventional Polymers by Depositing Plasma Polymers of Trimethylsilane and of Trimethylsilane + O2. , 1999, Journal of colloid and interface science.

[22]  Yasuda,et al.  Surface Modification of Conventional Polymers by Depositing Plasma Polymers of Trimethylsilane and of Trimethylsilane + O2. , 1999, Journal of colloid and interface science.

[23]  N. Otsuka,et al.  Electrical stability of polyimide siloxane films for interlayer dielectrics in multilevel interconnections , 1999 .

[24]  G. Gouda,et al.  A comparison of polypropylene-surface treatment by filamentary, homogeneous and glow discharges in helium at atmospheric pressure , 1998 .

[25]  Jaeyoung Park,et al.  Deposition of silicon dioxide films with an atmospheric-pressure plasma jet , 1998 .

[26]  Ulf W. Gedde,et al.  Hydrophobicity Recovery of Polydimethylsiloxane after Exposure to Corona Discharges , 1998 .

[27]  C. Klages,et al.  Plasma-enhanced chemical-vapour-deposition of thin films by corona discharge at atmospheric pressure , 1997 .

[28]  S. Tasaka,et al.  Plasma polymer deposition from mixture of tetramethoxysilane and oxygen on PET films and their oxygen gas barrier properties , 1997 .

[29]  D. Blair,et al.  A microwave temperature control system dedicated to a cryogenic sapphire-spaced Fabry-Pérot optical frequency reference , 1996 .

[30]  Hood Chatham,et al.  Oxygen diffusion barrier properties of transparent oxide coatings on polymeric substrates , 1996 .

[31]  Itani Tsukasa,et al.  Low Temperature Synthesis of Plasma Teos SiO 2 , 1996 .

[32]  M. Kogoma,et al.  Synthesis of plasma-polymerized tetraethoxysilane and hexamethyldisiloxane films prepared by atmospheric pressure glow discharge , 1995 .

[33]  D. Klee,et al.  Plasma-induced surface modifications on silicone intraocular lenses: chemical analysis and in vitro characterization. , 1991, Biomaterials.

[34]  Hirotsugu Yasuda,et al.  Glow discharge polymerization , 1981 .

[35]  D. K. Owens,et al.  Estimation of the surface free energy of polymers , 1969 .

[36]  Walter Noll,et al.  Chemistry and technology of silicones , 1968 .

[37]  A. G. Gaydon,et al.  The identification of molecular spectra , 1950 .