Handbook of Photomask Manufacturing Technology

Foreword by Yoshio Nishi Preface, Syed Rizvi INTRODUCTION Introduction to Mask Making A.G. Zanzal MASK WRITING Data Preparation P.J.M. van Adrichem and C.K. Kalus Mask Writers: An Overview S. Babin E-Beam Mask Writers N. Saitou Laser Mask Writers C. Rydberg OPTICAL MASKS Optical masks: An Overview N. Yoshioka Conventional Optical Masks S.A. Rizvi Advanced Optical Masks W. Maurer and F. Schellenberg NGL MASKS NGL Masks: An Overview K.R. Kimmel and M. Lercel Masks for Electron Beam Projection Lithography H. Sano, S. Palmer, and M. Yamabe Masks for Extreme Ultraviolet Lithography P-Y. Yan Masks for Ion Projection Lithography S.A. Rizvi, F-M. Kamm, J. Butschke, F. Letzkus, and H. Loeschner Mask for Proximity X-Ray Lithography M. Oda and H. Yoshihara MASK PROCESSING, MATERIALS, AND PELLICLES Mask Substrate S.A. Rizvi Resists for Mask Making B. Rathsack, D. Medeiros, and C.G. Wilson Resist Charging and Heating M. Bai, D. Chu, and F. Pease Mask Processing S.A. Rizvi Mask Materials: Optical Properties V. Liberman Pellicles T. Yen, C.B. Wang, and R. Heuser MASK METROLOGY, INSPECTION, EVALUATION, AND REPAIRS Photomask Feature Metrology J. Potzick Optical Critical Dimension Metrology R.J. Hoobler Photomask Critical Dimension Metrology in the Scanning Electron Microscope M.T. Postek Geometrical Characterization of Mask Using SPM S. Muckenhirn and A. Meyyappan Metrology of Image Placement M.T. Takac Optical Thin Film Metrology for Photomask Applications E. Apak Phase Measurement Tool for PSM H. Kusunose Mask Inspection: Theories and Principle A. Rosenbusch and S. Hemar Tool for Inspecting Masks: Lasertec MD 2500 M. Yonezawa and T. Matsuyama Tool for Mask Image Evaluation A. Zibold Mask Repairs R. Lee MODELING AND SIMULATION Modeling and Simulation A. Erdmann INDEX