Appearance of e-beam exposure tools with a high acceleration voltage has created a growing need for a chemically amplified resist (CAR) system with high sensitivity, high contrast, superior resolution and superior PCD (post-coating delay) stability. While mask-makers have been procuring resist-coated photomask blanks, it is generally considered that CARs must be spin-coated just prior to exposure due to its short shelf-life after coating. However, the industry would like to continue procuring pre-CAR-coated blanks from a blanks supplier, who also intends to support mask-makers in this way. This paper describes the results of a feasibility study on mask blanks coated with CARs for advanced e-beam reticle fabrication. Keyword: reticle, CAR (chemically amplified resist), PCD (post-coating delay), PSB (post-spin baking), PEB (post-exposure baking), RE-5120P, RE-5153P, NEB-22