Germanium surface passivation and atomic layer deposition of high-k dielectrics—a tutorial review on Ge-based MOS capacitors
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C. Detavernier | M. Caymax | Shao-Ren Deng | Qi Xie | D. Deduytsche | M. Schaekers | D. Lin | A. Delabie | X. Qu | Yu-Long Jiang