Subwavelength patterning of alkylsiloxane monolayers via nonlinear processing with single femtosecond laser pulses

Femtosecond laser patterning of octadecylsiloxane monolayers on quartz glass at λ=800nm, τ<30fs, and ambient conditions has been investigated. Selective decomposition of the coating with single laser pulses at subwavelength resolution can be carried out over a wide range of fluences from 4.2 down to 3.1J∕cm2. In particular, at a 1∕e laser spot diameter of 1.8μm, structures with a width down to 250nm and below were fabricated. This opens up a facile route towards laser fabrication of transparent templates with chemical structures down into the sub-100-nm-regime.

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