Pattern sensitive placement for manufacturability
暂无分享,去创建一个
[1] Li-Da Huang,et al. Optical proximity correction (OPC): friendly maze routing , 2004, DAC.
[2] Olivier Coudert,et al. Gate sizing for constrained delay/power/area optimization , 1997, IEEE Trans. Very Large Scale Integr. Syst..
[3] Evangeline F. Y. Young,et al. Optimal cell flipping in placement and floorplanning , 2006, 2006 43rd ACM/IEEE Design Automation Conference.
[4] Andrzej J. Strojwas,et al. Exploring regular fabrics to optimize the performance-cost trade-off , 2003, Proceedings 2003. Design Automation Conference (IEEE Cat. No.03CH37451).
[5] Thomas H. Cormen,et al. Introduction to algorithms [2nd ed.] , 2001 .
[6] Dinesh K. Sharma,et al. Resolution enhancement techniques for optical lithography , 2002 .
[7] Clifford Stein,et al. Introduction to Algorithms, 2nd edition. , 2001 .
[8] Lars Liebmann,et al. Layout impact of resolution enhancement techniques: impediment or opportunity? , 2003, ISPD '03.
[9] Andrzej J. Strojwas,et al. Design methodology for IC manufacturability based on regular logic-bricks , 2005, Proceedings. 42nd Design Automation Conference, 2005..
[10] David Z. Pan,et al. RADAR: RET-aware detailed routing using fast lithography simulations , 2005, Proceedings. 42nd Design Automation Conference, 2005..
[11] Chul-Hong Park,et al. Detailed placement for improved depth of focus and CD control , 2005, Proceedings of the ASP-DAC 2005. Asia and South Pacific Design Automation Conference, 2005..
[12] Chris C. N. Chu,et al. FastPlace: efficient analytical placement using cell shifting, iterative local refinement,and a hybrid net model , 2005, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.