Polymers in Microlithography: An Overview Bronsted Acid Generation from Triphenylsulfonium Salts in Acid-Catalyzed Photoresist Films Chemically Amplified Resist: Effect of Polymer and Acid Generator Structure Copolymer Approach to Design of Sensitive Deep-UV Resist Systems with High Thermal Stability and Dry Etch Resistance Nonswelling Negative Resists Incorporating Chemical Amplification: Electrophilic Aromatic Substitution Approach Acid-Catalyzed Cross-Linking in Phenolic-Resin-Based Negative Resists New Design for Self-Developing Imaging Systems Based on Thermally Labile Polyformals Polysilanes: Solution Photochemistry and Deep-UV Lithography Syntheses of Base-Soluble Si Polymers and Their Application to Resists Lithographic Evaluation of Phenolic Resin-Dimethyl Soloxane Block Copolymers Preparation of a Novel Silicone-Based Positive Photoresist and Its Application to an Image Reversal Process Photooxidation of Polymers: Application to Dry-Developed Single-Layer Deep-UV Resists Kinetics of Polymer Etching in an Oxygen Glow Discharge Quantitative Analysis of a Laser Interferometer Waveform Obtained During Oxygen Reactive-Ion Etching of Thin Polymer Films Evaluation of Several Organic Materials as Planarizing Layers for Lithographic and Etchback Processing New Negative Deep-UV Resist for KrF Excimer Laser Lithography Characterization of a Thiosulfate Funtionalized Polymer: A Water-Soluble Photosensitive Zwitterion Pyrimidine Derivatives as Lithographic Materials Synthesis of New Metal-Free Diazonium Salts and Their Applications to Microlithography Photobleaching Chemistry of Polymers Containing Anthracenes Lithography and Spectroscopy of Ultrathin Langmuir-Blodgett Polymer Films Dissolution of Phenolic Resins and Their Blends Solvent Concentration Profile of Poly(methyl methacrylate) Dissolving in Methyl Ethyl Ketone: A Fluorescence-Quenching Study Molecular Studies on Laser Ablation Processes of Polymeric Materials by Time-Resolved Luminescence Spectroscopy Mechanism of Polymer Photoablation Explored with a Quartz Crystal Microbalance Mechanism of UV- and VUV-Induced Etching of Poly(methyl methacrylate): Evidence for an Energy-Dependent Reaction