Growth of (111)-oriented epitaxial and textured ferroelectric Y-doped HfO2 films for downscaled devices
暂无分享,去创建一个
H. Funakubo | O. Sakata | Takao Shimizu | T. Shiraishi | H. Uchida | T. Kiguchi | T. Konno | Akihiro Akama | Kiliha Katayama | Syogo Nakamura