论文信息 - Intel 22nm FinFET (22FFL) Process Technology for RF and mm Wave Applications and Circuit Design Optimization for FinFET Technology

Intel 22nm FinFET (22FFL) Process Technology for RF and mm Wave Applications and Circuit Design Optimization for FinFET Technology

Intel 22FFL is a unique FinFET process technology optimized for RF and mmWave applications supporting superior RF performance to planar technologies with both $\boldsymbol{f_{t}}$ and $\boldsymbol{f_{max}}$ of NMOS above 300 GHz and 450 GHz respectively. Flicker noise improvement over planar technologies and excellent gain-power efficiency enabling low-power wireless applications are demonstrated.

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