The formation of waveguides and modulators in LiNbO3 by ion implantation

Ion implantation is an attractive method for writing optical circuits for use in integrated optics. In LiNbO3 it is shown that there are large changes produced in both refractive indices n0 and ne by the energy deposited in nuclear collisions between the implanted ions and the lattice. The process is insensitive to ion species and at 300 K a universal curve exists for the decrease of n0 as a function of deposited energy by nuclear collisions. Saturation changes of −6% occur at 300 °K, and larger values are noted for 77 K implants. The saturation condition is reached after the deposition of ∼1022 keV cm−3 from the ion beams. Because the indices are reduced, ion beams have been used to write low index boundaries to define waveguiding regions. By using energetic light ions (e.g., 2‐MeV He+) negligible change is produced in the surface layer where the energy loss is primarily electronic and thus the low index region is formed deep within the solid. The computed and measured mode characteristics are in good ag...

[1]  L. R. Bloom,et al.  Large refractive index change induced by ion implantation in lithium niobate , 1974 .

[2]  E. R. Schineller,et al.  Optical Waveguides Formed by Proton Irradiation of Fused Silica , 1968 .

[3]  E. P. EerNisse,et al.  Ionization dilatation effects in fused silica from 2 to 18‐keV electron irradiation , 1974 .

[4]  R. B. Murray,et al.  Ion bombardment of alkali halides, III: Track-effect analysis of measured damage profiles in KCl , 1977 .

[5]  I. Kaminow,et al.  Metal‐diffused optical waveguides in LiNbO3 , 1974 .

[6]  J. Davenas,et al.  Ionisation induced defects in alkali halide single crystals , 1976 .

[7]  G. B. Krefft.  Ionization‐stimulated annealing effects on displacement damage in magnesium oxide , 1977 .

[8]  D. W. Palmer,et al.  Light ion irradiation experiments suggest an ionization damage mechanism for silicon , 1974 .

[9]  J. Carruthers,et al.  Optical waveguiding layers in LiNbO3 and LiTaO3 , 1973 .

[10]  P. Townsend,et al.  Mechanisms of defect formation , 1975 .

[11]  R S Pease,et al.  REVIEW ARTICLES: The Displacement of Atoms in Solids by Radiation , 1955 .

[12]  P. Townsend.  Ion implantation and integrated optics , 1977 .

[13]  T. A. Dellin,et al.  Volume, index‐of‐refraction, and stress changes in electron‐irradiated vitreous silica , 1977 .

[14]  A. J. Houghton,et al.  Changes in the chemical stability of ion-implanted silica glass , 1976 .

[15]  H. M. Presby,et al.  Refractive index variations in proton‐bombared fused silica , 1974 .

[16]  T. Ranganath,et al.  Suppression of Li2O out‐diffusion from Ti‐diffused LiNbO3 optical waveguides , 1977 .

[17]  M. Nunoshita,et al.  Mode control of Ti-diffused LiNbO(3) slab optical waveguide. , 1977, Applied optics.

[18]  Optical waveguides in LiNbO3 by ion exchange technique , 1975 .

[19]  P. Tien.  Integrated optics and new wave phenomena in optical waveguides , 1977 .

[20]  G. W. Arnold,et al.  Atomic displacement and ionization effects on the optical absorption and structural properties of ion‐implanted Al2O3 , 1974 .

[21]  E. P. Eernisse,et al.  Volume expansion and annealing compaction of ion‐bombarded single‐crystal and polycrystalline α‐Al2O3 , 1978 .

[22]  Amnon Yariv,et al.  Integrated Optics , 2019, The Microflow Cytometer.

[23]  P. Townsend,et al.  Optical waveguides formed by low‐energy electron irradiation of silica , 1976 .

[24]  Gérard Destefanis,et al.  Optical waveguides in LiNbO3 formed by ion implantation of helium , 1978 .

[25]  E. P. Eernisse.  Stress in ion‐implanted CVD Si3N4 films , 1977 .