Dual-Step Selective Homoepitaxy of Ge with Low Defect Density and Modulated Strain Based on Optimized Ge/Si Virtual Substrate
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Guilei Wang | H. Radamson | Yong Du | Yuanhao Miao | Buqing Xu | Ben Li | Z. Kong | Xuewei Zhao | Hongxiao Lin | Jiale Su | Wenjuan Xiong | Yijie Wang | Yuanyuan Wu | Y. Du | W. Xiong