Crosstalk-affected delay analysis in nanometer technologies

This article presents a detailed analysis of the crosstalk-affected delay of coupled interconnects considering process variations. We utilise a distributed RC-π model of the interconnections to accurately model process variations. In particular, we perform a detailed investigation of various crosstalk scenarios and study the impact of different parameters on crosstalk delay. Although accounting for the effect of correlations among parameters of the neighbouring wire segments, statistical properties of the crosstalk-affected propagation delays are characterised and discussed. Monte Carlo-based simulations using Spice demonstrate the effectiveness of the proposed approach in accurately modeling the correlation-aware process variations and their impact on interconnect delay in the presence of crosstalk.

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