Surface processing of PMMA and metal nano-particle resist by sub-micrometer focusing of coherent extreme ultraviolet high-order harmonics pulses.
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K. Sakaue | H. Ogawa | M. Nishikino | H. Mimura | K. Yamanouchi | T. Shibuya | M. Ishino | T. Higashiguchi | R. Kuroda | A. Iwasaki | T. Dinh | R. Hayashi | H. Motoyama