论文信息 - Effects of O2 and He on the properties of the trimethyl silane based low-k films - 字舞流文

Effects of O2 and He on the properties of the trimethyl silane based low-k films

J. Sudijono | S. Mhaisalkar | K. Zeng | L. Goh | J. Widodo | L. Hsia | P. Tan | W. Lu | S. Ong