10-MB/s multi-level programming of Gb-scale flash memory enabled by new AG-AND cell technology
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Y. Sasago | H. Kurata | H. Kume | S. Saeki | T. Arigane | S. Kamohara | Y. Goto | T. Kobayashi
[1] Kang-Deog Suh,et al. Impact of floating gate dry etching on erase characteristics in NOR flash memory , 2002, IEEE Electron Device Letters.