Experiments and modeling of dual reactive magnetron sputtering using two reactive gases

Reactive sputtering from two elemental targets, aluminum and zirconium, with the addition of two reactive gases, oxygen and nitrogen, is studied experimentally as well as theoretically. The complex ...

[1]  J. Musil,et al.  Influence of the pumping speed on the hysteresis effect in the reactive sputtering of thin films , 1987 .

[2]  S. Berg,et al.  In situ diagnostic studies of reactive co-sputtering from two targets by means of soft x-ray and optical emission spectroscopy , 1997 .

[3]  D. J. Christie,et al.  Control of reactive sputtering processes , 2005 .

[4]  I. Safi,et al.  Recent aspects concerning DC reactive magnetron sputtering of thin films: a review , 2000 .

[5]  S. Berg,et al.  Hysteresis effects in the sputtering process using two reactive gases , 1995 .

[6]  Bertrand G. Bovard,et al.  Ion-assisted processing of optical coatings , 1991 .

[7]  Composition and formation mechanism of zirconium oxynitride films produced by reactive direct current magnetron sputtering , 2004 .

[8]  E. Wallin,et al.  Molecular content of the deposition flux during reactive Ar∕O2 magnetron sputtering of Al , 2006 .

[9]  Sören Berg,et al.  Modeling of reactive sputtering of compound materials , 1987 .

[10]  S. Berg,et al.  Fundamental understanding and modeling of reactive sputtering processes , 2005 .

[11]  S. Hofmann.  Target and substrate surface reaction kinetics in magnetron sputtering of nitride coatings , 1990 .

[12]  R. Wallace,et al.  High-κ gate dielectrics: Current status and materials properties considerations , 2001 .

[13]  S. Berg,et al.  Reactive sputtering using two reactive gases, experiments and computer modeling , 1993 .

[14]  M. Wuttig,et al.  Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitrides , 2006 .

[15]  H. Blom,et al.  Modeling of multicomponent reactive sputtering , 1991 .

[16]  W. Hoyer,et al.  Growth of nitrogen stabilised cubic ZrO2 phase by reactive magnetron sputtering using two reactive gases , 1999 .