论文信息 - Surface etching, chemical modification and characterization of silicon nitride and silicon oxide—selective functionalization of Si3N4 and SiO2 - 字舞流文

Surface etching, chemical modification and characterization of silicon nitride and silicon oxide—selective functionalization of Si3N4 and SiO2

M. Halls | Y. Chabal | D. Michalak | R. Hourani | H. Zuilhof | S. Pujari | Li-Hong Liu | T. P. Chopra | W. Cabrera | D. Dick | J. Veyan