DESIGN AND FABRICATION WITH ELECTRON BEAM LITHOGRAPHY OF A DIFFRACTIVE OPTICAL ELEMENT
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In aceastǎ lucrare sunt prezentate rezultate in premierǎ la scarǎ naţionalǎ privind proiectarea si fabricarea prin litografie cu fascicul de electroni a unui element optic difractiv. Acest element optic difractiv funcţioneazǎ in reflexie si are douǎ nivele. Elementul optic difractiv a fost proiectat sǎ reproducǎ logo-ul „IMT” la infinit. Metodele de proiectare si caracterizare prezentate aici pot fi utilizate pentru realizarea de elemente optice difractive cu aplicaţii diverse. In this work the first results obtained at national level regarding the design and fabrication with electron beam lithography of a diffractive optical element are presented. This diffractive optical element has two levels and it works in reflection. The purpose of the diffractive optical element is the reproduction of „IMT” logo in the far-field. The approach for the design and fabrication presented here can be extended forr the realization of the diffractive optical elements with various application.
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