High refractive index and high transparency HfO2 nanocomposites for next generation lithography

HfO2 nanoparticles stabilized with selected ligands possess high refractive index and low absorbance under 193 nm radiation. These materials combined with an appropriate photopolymer were used as a nanocomposite photoresist. The resulting nanocomposite materials were used successfully for high resolution patterning.

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