In-Situ Optical Monitoring Of Thin Film Deposition

Real time in-situ optical measurements play a vital role in the monitoring and control of thin film deposition and etching. Techniques include single and multiwavelength monitoring of the reflectance and/or transmittance of the coating substrate, in-situ ellipsometry, and spectroscopic diagnostics of the vapour species. This paper will review these techniques and examine recent trends.

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