In-Situ Optical Monitoring Of Thin Film Deposition
暂无分享,去创建一个
[1] E Pelletier,et al. Automatic determination of the optical constants of inhomogeneous thin films. , 1982, Applied optics.
[2] R P Netterfield,et al. Coating Fabry-Perot interferometer plates with broadband multilayer dielectric mirrors. , 1980, Applied optics.
[3] H. Macleod. 4.1 The monitoring of thin films for optical purposes , 1977 .
[4] D. Mckenzie,et al. Characterization of a Ti vacuum arc and the structure of deposited Ti and TiN films , 1987 .
[5] S. Ogura,et al. Measurements of Spectral Characteristics of Optical Thin Film by Rapid Scanning Spectrophotometer , 1974 .
[6] E Pelletier,et al. Optical thin film monitoring—Recent advances and limitations , 1981 .
[7] E Pelletier,et al. Wideband optical monitoring of nonquarterwave multilayer filters. , 1979, Applied optics.
[8] H. A. Macleod,et al. Turning Value Monitoring of Narrow-band All-dielectric Thin-film Optical Filters , 1972 .
[9] P. Martin,et al. Characterization of growing thin films by in situ ellipsometry, spectral reflectance and transmittance measurements, and ion‐scattering spectroscopy , 1985 .
[10] C. Lu,et al. Rate controlling and composition analysis of alloy deposition processes by electron impact emission spectroscopy (EIES) , 1977 .
[11] R L Shoemaker,et al. Development of an automated scanning monochromator for monitoring thin films. , 1985, Applied optics.
[12] P. D. Swift,et al. Characteristics of titanium arc evaporation processes , 1987 .
[13] H. Weakliem. Chapter 10 Diagnostics of Silane Glow Discharges Using Probes and Mass Spectroscopy , 1984 .