In-Situ Cluster Processing For Advanced Semiconductor Technologies

Each generation of VLSI semiconductor technology is more complex than the previous generation. Therefore, to help minimize manufacturing costs, turnaround time and defect levels, process clustering has become an attractive alternative to traditional, nonclustering processing. A unique application to cluster processing is in-situ cluster processing, defined as multiprocess steps using various chambers under vacuum inside a single machine. The use of four single wafer reactors (SWR) combined with a common load-lock capable of deposition and etch processes was examined for spacer processes. Two examples will be discussed in some detail: spacer formation and recess/collar formation.