Atomic layer deposition of a ruthenium thin film using a precursor with enhanced reactivity
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S. Han | C. Park | B. Park | G. Kim | Jeongwook Hwang | Taek‐Mo Chung | Y. Byun | Taeyong Eom | Seungmin Yeo | Seung-Hun Lee | Hanuel Yang
[1] C. Hwang,et al. Atomic layer deposition of Ru thin films using (2,4-dimethyloxopentadienyl)(ethylcyclopentadienyl)Ru and the effect of ammonia treatment during the deposition , 2020 .
[2] J. F. Conley,et al. Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor , 2017 .
[3] Soo‐Hyun Kim,et al. Ruthenium and ruthenium dioxide thin films deposited by atomic layer deposition using a novel zero-valent metalorganic precursor, (ethylbenzene)(1,3-butadiene)Ru(0), and molecular oxygen , 2015 .
[4] J. Han,et al. Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Thin Films from a Zero-Valent (1,5-Hexadiene)(1-isopropyl-4-methylbenzene)ruthenium Complex and O2 , 2014 .
[5] Min Kyu Kim,et al. Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition , 2014 .
[6] Soo‐Hyun Kim,et al. Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization , 2013 .
[7] Min Kyu Kim,et al. Atomic layer deposition of Ru thin films using a Ru(0) metallorganic precursor and O2 , 2013 .
[8] D. Kang,et al. Thermal Atomic Layer Deposition (ALD) of Ru Films for Cu Direct Plating , 2011 .
[9] G. Rubloff,et al. Atomic Layer Deposition of Ruthenium Using the Novel Precursor bis(2,6,6-trimethyl-cyclohexadienyl)ruthenium , 2011 .
[10] C. Hwang,et al. Growth of RuO2 Thin Films by Pulsed-Chemical Vapor Deposition Using RuO4 Precursor and 5% H2 Reduction Gas , 2010 .
[11] C. Hwang,et al. Investigation on the Growth Initiation of Ru Thin Films by Atomic Layer Deposition , 2010 .
[12] Jae Hyun Kim,et al. Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O2 , 2009 .
[13] Sang-Joon Park,et al. Atomic Layer Deposition of Ruthenium and Ruthenium-oxide ThinFilms by Using a Ru(EtCp)$_{2}$ Precursor and Oxygen Gas , 2009 .
[14] C. Hwang,et al. Chemical Vapor Deposition of Ru Thin Films with an Enhanced Morphology, Thermal Stability, and Electrical Properties Using a RuO4 Precursor , 2009 .
[15] C. Hwang,et al. Atomic Layer Deposition of Ru Thin Films Using 2,4-(Dimethylpentadienyl)(ethylcyclopentadienyl)Ru by a Liquid Injection System , 2007 .
[16] C. Hwang,et al. High dielectric constant TiO2 thin films on a Ru electrode grown at 250 °C by atomic-layer deposition , 2004 .
[17] M. Ritala,et al. Atomic layer deposition of ruthenium thin films from Ru(thd)(3) and oxygen , 2004 .
[18] Jae-Hoon Kim,et al. Atomic Layer Deposition of Ruthenium Thin Films for Copper Glue Layer , 2004 .
[19] T. Moffat,et al. Seedless Superfill: Copper Electrodeposition in Trenches with Ruthenium Barriers , 2003 .
[20] M. Ritala,et al. Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum , 2003 .
[21] M. Ritala,et al. Ruthenium Thin Films Grown by Atomic Layer Deposition , 2003 .
[22] U. Englert,et al. Efficient Synthesis of Ruthenium(II) η5-Dienyl Compounds Starting from Di-μ-chlorodichloro- bis[(1−3η:6−8η)-2,7-dimethyloctadienediyl]diruthenium(IV). Versatile Precursors for Enantioselective Hydrogenation Catalysts , 2000 .
[23] C. Hwang. (Ba,Sr)TiO3 thin films for ultra large scale dynamic random access memory.: A review on the process integration , 1998 .
[24] W. Gladfelter,et al. Chemical Vapor Deposition of Ruthenium and Osmium Thin Films Using (Hexafluoro-2-butyne)tetracarbonylruthenium and -osmium , 1993 .
[25] Malcolm L. H. Green,et al. Nucleophilic addition to organotransition metal cations containing unsaturated hydrocarbon ligands : A survey and interpretation , 1978 .