论文信息 - Techniques for using emitting probes for potential measurement in rf plasmas

Techniques for using emitting probes for potential measurement in rf plasmas

Investigations of the effects of rf on plasma potential measurements with electron emitting probes and methods for interpreting data are presented. Techniques correspond to the floating and inflection point methods of single‐emitting and differential emitting probes, respectively. A simple method of measurement of plasma potential fluctuations is given which makes use of time‐averaged emitting probe I–V characteristics.

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