A Study of Selectively Digital Etching Silicon-Germanium with Nitric and Hydrofluoric Acids
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Technology of China | A. Du | Guilei Wang | Huilong Zhu | Z. Kong | Junjie Li | Yongkui Zhang | K. Jia | X. Ai | Xiaogen Yin | Chen Li | Lu Xie | Yangyang Li | Liheng Zhao | Chinese Academy of Science. | Shishuai Ma | Teng-Wei Yang | Henry Li | Henry H. Radamson Key Laboratory of Microelectronics Devices | Integrated Technology | Institute of Microelectronics