Dependence of Thin Oxide Films Quality on Surface Micro-Roughness
暂无分享,去创建一个
Masayuki Miyashita | Tadahiro Ohmi | I. Kawanabe | M. Miyashita | M. Itano | T. Imaoka | M. Itano | T. Imaoka | I. Kawanabe | T. Ohmi
[1] T. Ohmi,et al. Particle-free wafer cleaning and drying technology , 1989 .
[2] T. Ohmi,et al. Surface active buffered hydrogen fluoride having excellent wettability for ULSI processing , 1990 .
[3] Tadahiro Ohmi,et al. Future trends and applications of ultra-clean technology , 1989, International Technical Digest on Electron Devices Meeting.
[4] W. Kern. Cleaning solutions based on hydrogen peroxide for use in silicon semiconductor technology , 1970 .