Shot noise and process window study for printing small contact holes using EUV lithography
暂无分享,去创建一个
[1] Pei-yang Yan,et al. System integration and performance of the EUV engineering test stand , 2001, SPIE Advanced Lithography.
[2] Kenneth A. Goldberg,et al. At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic , 2001 .
[3] J. Walkup,et al. Statistical optics , 1986, IEEE Journal of Quantum Electronics.
[4] Jeffrey Bokor,et al. EUV interferometry of the 0.3-NA MET optic , 2003, SPIE Advanced Lithography.
[5] Jonathan L. Cobb,et al. Estimated impact of shot noise in extreme-ultraviolet lithography , 2003, SPIE Advanced Lithography.