Mask synthesis and verification based on geometric model for surface micro-machined MEMS

Traditional MEMS (microelectromechanical system) design methodology is not a structured method and has become an obstacle for MEMS creative design. In this paper, a novel method of mask synthesis and verification for surface micro-machined MEMS is proposed, which is based on the geometric model of a MEMS device. The, emphasis is focused on synthesizing the masks at the basis of the layer model generated from the geometric model of the MEMS device. The method is comprised of several steps; the correction of the layer model, the generation of initial masks and final masks including multi-layer etch masks, and mask simulation. Finally some test results are given.