Integration of Self-Assembled Redox Molecules in Flash Memory Devices

Self-assembled monolayers (SAMs) of either ferrocenecarboxylic acid or 5-(4-Carboxyphenyl)-10,15,20-triphenyl-porphyrin-Co(II) (CoP) with a high- dielectric were integrated into the Flash memory gate stack. The molecular reduction-oxidation (redox) states are used as charge storage nodes to reduce charging energy and memory window variations. Through the program/erase operations over tunneling barriers, the device structure also provides a unique capability to measure the redox energy without strong orbital hybridization of metal electrodes in direct contact. Asymmetric charge injection behavior was observed, which can be attributed to the Fermi-level pinning between the molecules and the high- dielectric. With increasing redox molecule density in the SAM, the memory window exhibits a saturation trend. Three programmable molecular orbital states, i.e., CoP0, CoP1-, and CoP2-, can be experimentally observed through a charge-based nonvolatile memory structure at room temperature. The electrostatics is determined by the alignment between the highest occupied or the lowest unoccupied molecular orbital (HOMO or LUMO, respectively) energy levels and the charge neutrality level of the surrounding dielectric. Engineering the HOMO-LUMO gap with different redox molecules can potentially realize a multibit memory cell with less variation.

[1]  Jerry Tersoff,et al.  Theory of semiconductor heterojunctions: The role of quantum dipoles , 1984 .

[2]  Tuo-Hung Hou,et al.  Fermi-Level Pinning in Nanocrystal Memories , 2007, IEEE Electron Device Letters.

[3]  D. Gilmer,et al.  Fermi Level Pinning with Sub-monolayer MeOx and Metal Gates , 2003 .

[4]  D. Gilmer,et al.  Fermi level pinning with sub-monolayer MeOx and metal gates [MOSFETs] , 2003, IEEE International Electron Devices Meeting 2003.

[5]  Edwin C. Kan,et al.  Programable molecular orbital states of C60 from integrated circuits , 2006 .

[6]  S. Scheiner,et al.  Electronic structure and bonding in metal porphyrins, metal=Fe, Co, Ni, Cu, Zn , 2002 .

[7]  Qiliang Li Approach towards Hybrid Silicon/Molecular Electronics for Memory Applications , 2005 .

[8]  C. Powell,et al.  Consistency of calculated and measured electron inelastic mean free paths , 1999 .

[9]  J. Lindsey,et al.  Studies related to the design and synthesis of a molecular octal counter , 2001 .

[10]  Jacques Weber,et al.  Numerical evaluation of the internal orbitally resolved chemical hardness tensor: Second order chemical reactivity through thermal density functional theory , 1998 .

[11]  D Vuillaume,et al.  Electron transport through rectifying self-assembled monolayer diodes on silicon: Fermi-level pinning at the molecule-metal interface. , 2006, The journal of physical chemistry. B.

[12]  Tuo-Hung Hou,et al.  Statistical Metrology of Metal Nanocrystal Memories With 3-D Finite-Element Analysis , 2009, IEEE Transactions on Electron Devices.

[13]  Gerard Ghibaudo,et al.  Modeling of the programming window distribution in multinanocrystals memories , 2003 .

[14]  Properties of functionalized redox-active monolayers on thin silicon dioxide-a study of the dependence of retention time on oxide thickness , 2005, IEEE Transactions on Nanotechnology.

[15]  Jonathan S. Lindsey,et al.  Molecular Memories That Survive Silicon Device Processing and Real-World Operation , 2003, Science.

[16]  James R Engstrom,et al.  The reaction of tetrakis(dimethylamido)titanium with self-assembled alkyltrichlorosilane monolayers possessing -OH, -NH2, and -CH3 terminal groups. , 2005, Journal of the American Chemical Society.

[17]  Jonathan S. Lindsey,et al.  Capacitance and conductance characterization of ferrocene-containing self-assembled monolayers on silicon surfaces for memory applications , 2002 .

[18]  Edwin C. Kan,et al.  Self-assembly of metal nanocrystals on ultrathin oxide for nonvolatile memory applications , 2005 .

[19]  U. Ganguly,et al.  Asymmetric electric field enhancement in nanocrystal memories , 2005, IEEE Electron Device Letters.

[20]  Jean-Luc Brédas,et al.  Single-electron transistor of a single organic molecule with access to several redox states , 2003, Nature.

[21]  Jonathan S. Lindsey,et al.  Electrical characterization of redox-active molecular monolayers on SiO2 for memory applications , 2003 .

[22]  J. H. Scofield,et al.  Hartree-Slater subshell photoionization cross-sections at 1254 and 1487 eV , 1976 .

[23]  Tuo-Hung Hou,et al.  Design Optimization of Metal Nanocrystal Memory—Part II: Gate-Stack Engineering , 2006, IEEE Transactions on Electron Devices.