论文信息 - Fabrication and Characterization of 0.2μm InAlAs/InGaAs Metamorphic HEMT’s with Inverse Step-Graded InAlAs Buffer on GaAs Substrate

Fabrication and Characterization of 0.2μm InAlAs/InGaAs Metamorphic HEMT’s with Inverse Step-Graded InAlAs Buffer on GaAs Substrate

Metamorphic InAlAs/InGaAs HEMT are successfully demonstrated, exhibiting several advantages over conventional P-HEMT on GaAs and LM-HEMT on InP substrate. The strain-relaxed metamorphic structure is grown by MBE on the GaAs substrate with the inverse-step graded InAlAs metamorphic buffer. The device with 40% indium content shows the better characteristics than the device with 53% indium content. The fabricated metamorphic HEMT with T-gate and 40% indium content shows the excellent DC and microwave characteristics of .

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