A CAD architecture for microelectromechanical systems

A CAD architecture for microelectromechanical systems is presented in which conventional mask layout and process simulation tools are linked to three-dimensional mechanical CAD and finite-element tools for analysis and simulation. The architecture is exercised by an elementary example on the stress-induced curvature of an oxidized silicon wafer. An architecture for an object-oriented material property simulator in which material properties and their process dependence are stored and are accessed based on the specific process conditions is also presented.<<ETX>>

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