CDU linear model based on aerial image principal components

In this paper, we present an image quality model and a process window model that is linear or quadratic with respect to common pupil space errors. Similar to other CDU models in its simplicity, our model expands linear representation to comprehensive image quality specs in a large focus-dose grid. With this model we identify corrections to the full Bossung curve or process window shapes that are proportional to aberration levels.

[1]  Reiner Garreis,et al.  Impact of wavefront errors on low k1 processes at extremely high NA , 2003, SPIE Advanced Lithography.

[2]  Steve D. Slonaker,et al.  Zernike sensitivity method for CD distribution , 2003, SPIE Advanced Lithography.