Equipment for Multivariate Control, Simulation, Optimization, and Signal Processing for the Microlithographic Process

Abstract : This report summarizes the results associated with instrumentation purchased under DURIP contract F49620-98-1-0263 in support of AFOSR/DARPA MURI Program on 'Multivariable Control, Simulation, Optimization, and Signal Processing for the Microlithographic Process'. This project is generally concerned with the application of systems techniques to the lithographic sequence used for patterning integrated circuits at very small dimensions (less than 250 nanometers). This complex sequence is comprised of photoresist processing, mask design, and optical illumination steps. Lithography is a major technological area that may impede the continued increase in integrated circuit density (Moore's Law).