Approach of UV nanoimprint lithography using template with gas-permeable and gaseous adsorption for reduction of air-trapping issue

In this paper, we studied a novel approach, UV nanoimprint lithography using glucose-based template with gaspermeable and gaseous adsorption for reduction of air-trapping issue. The air-trapping issue in UV nanoimprint lithography resist is a cause of pattern failure in resist or UV curable materials. The results of 180 nm dense line patterning of UV curable patterning materials containing acetone in UV nanoimprint lithography using glucose-based template with gas-permeable and gaseous adsorption were effected to reduce the pattern failure as compared with that of the poly(dimethylsiloxane) without gas-permeable and gaseous adsorption as the reference. The proposed UV nanoimprint lithography using glucose-based template with gas-permeable and gaseous adsorption is one of the most promising processes ready to be investigated for mass-production of photomask applications.

[1]  Satoshi Takei,et al.  Ultraviolet nanoimprint lithography using cyclodextrin-based porous template for pattern failure reduction , 2015 .

[2]  Atsushi Sekiguchi,et al.  Ecofriendly antiglare film derived from biomass using ultraviolet curing nanoimprint lithography for high-definition display , 2013 .

[3]  Satoshi Takei,et al.  Inedible cellulose-based biomass resist material amenable to water-based processing for use in electron beam lithography , 2015 .

[4]  Takahiro Kozawa,et al.  Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer , 2011 .

[5]  Satoshi Takei,et al.  Study of High Etch Rate Bottom Antireflective Coating and Gap Fill Materials Using Dextrin Derivatives in ArF Lithography , 2007 .

[6]  Satoshi Takei,et al.  Sub-70 nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography , 2016 .

[7]  C. G. Wilson,et al.  A Decade of Step and Flash Imprint Lithography , 2009 .

[8]  Atsushi Sekiguchi,et al.  Nanoimprint Resist Material Containing Ultraviolet Reactive Fluorine Surfactant for Defect Reduction in Lithographic Fabrication , 2012 .

[9]  Takahiro Kozawa,et al.  Organic solvent-free water-developable sugar resist material derived from biomass in green lithography , 2014 .

[10]  Takuya Kitagawa,et al.  A novel template-release method for low-defect nanoimprint lithography , 2014 .

[11]  Satoshi Takei,et al.  Eco-friendly, water-repellent, light-transparent film derived from psicose using nanoimprint lithography , 2015 .

[12]  David P. Mancini,et al.  Step and Flash Imprint Lithography modeling and process development , 2004 .

[13]  Takahiro Kozawa,et al.  Eco-friendly electron beam lithography using water-developable resist material derived from biomass , 2012 .

[14]  Hiroshi Hiroshima,et al.  Elimination of Pattern Defects of Nanoimprint under Atmospheric Conditions , 2003 .