Development and characterization of semiconductor ion detectors for plasma diagnostics in the range over 0.3 keV
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Y. Nakashima | K. Takahashi | T. Cho | J. Kohagura | M. Hirata | T. Okamura | Y. Sakamoto | T. Tamano | K. Yatsu | S. Miyoshi | K. Makino | S. Kanke