Sputter‐induced changes in permalloy target microstructure

Permalloy films were deposited with an S‐gun magnetron rf sputtering unit and permalloy targets. The crystallographic textures of the targets at the beginning and at the end of their lives were determined by x‐ray diffraction measurements. Sputter‐induced changes in target crystal texture and x‐ray linewidths were observed. Mossbauer effect spectra indicated a marked magnetic texture rotation resulting from the magnetron sputtering. Changes in the target microstructure caused by magnetron sputtering were target dependent. These changes were correlated with observed drifts in the deposited permalloy film magnetostriction through target life.