论文信息 - A Multichannel Depth Probe Fabricated Using Electron-Beam Lithography

A Multichannel Depth Probe Fabricated Using Electron-Beam Lithography

A multielectrode probe structure is described in which several thin-film metal electrodes are defined on the outer surface of a glass micropipette using electron-beam lithography. Electrode geometries are controlled to within one micron, resulting in electrode recording characteristics which are extremely well matched. Recording sites are 5 , um wide rings spaced 100 , um apart in depth. Analysis and characterization show the structure to be capable of accurately recording tissue potentials with a minimum of tissue damage. Use of these probes in current source-density (CSD) analysis of extraceliular current flow is described.

K. Wise | L. T. Rutledge | Phillip Pochay | L. Allard

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