In-Situ Optical Monitoring Of Thin Films During Evaporation
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An optical monitoring system for the in-situ reflectivity measurement on the actual moving substrates during e-beam thin film batch deposition is described. The reflectivity of one of the substrates mounted on the caroussel and moving in a planetary motion during the deposition is measured at 2 laser wavelengths (HeNe green and red) and compared with computed curves to determine the end-points. Examples of deposited TiO2 films and a multi-layer dielectric mirror are given.
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