Fabrication of nanostructures using atomic‐force‐microscope‐based lithography

We describe a novel technique for fabricating metallic nanostructures on an arbitrary substrate using an atomic force microscope (AFM). An AFM is used to plow a pattern through the top of two resist layers spun onto a substrate. The resist is then developed to create a mask through which material can be deposited. By changing the applied force, the top resist‐layer thickness, or the development time, the linewidth can be varied. Continuous metallic wires ∼500 A×400 A×15 μm have been fabricated on bare substrates and between contact pads.