Mechanical Properties of Microsensor Materials: How to Deal with the Process Dependences?
暂无分享,去创建一个
[1] Henry I. Smith,et al. Low stress tungsten absorber for X-ray masks , 1990 .
[2] Michael L. Heytens,et al. GESTALT: an expressive database programming system , 1989, SGMD.
[3] Minseok Choi,et al. Stress Effects in Boron‐Implanted Polysilicon Films , 1984 .
[4] Roger T. Howe,et al. Polycrystalline and amorphous silicon micromechanical beams: annealing and mechanical properties , 1983 .
[5] Y. Zhang,et al. Pressure sensor design and simulation using the CAEMENS-D , 1990, IEEE 4th Technical Digest on Solid-State Sensor and Actuator Workshop.
[6] D. W. Burns,et al. Fine-grained polysilicon films with built-in tensile strain , 1988 .
[7] H. Sunami,et al. Generation of Dislocations Induced by Chemical Vapor Deposited Si3N4 Films on Silicon , 1972 .
[8] T. Kamins. Structure and Properties of LPCVD Silicon Films , 1980 .
[9] Eugene A. Irene,et al. A Viscous Flow Model to Explain the Appearance of High Density Thermal SiO2 at Low Oxidation Temperatures , 1982 .
[10] D. W. Burns,et al. Mechanical properties of fine grained polysilicon-the repeatability issue , 1988, IEEE Technical Digest on Solid-State Sensor and Actuator Workshop.
[11] L. M. Landsberger,et al. Refractive index, relaxation times and the viscoelastic model in dry‐grown SiO2 films on Si , 1987 .
[12] George M. Koppelman,et al. OYSTER, a three-dimensional structural simulator for microelectromechanical design , 1989 .
[13] C. Goldsmith,et al. Measurement of stresses generated in cured polyimide films , 1983 .
[14] Hideo Yoshihara,et al. Silicon Nitride Single-Layer X-Ray Mask , 1981 .
[15] K. L. Mittal,et al. Polyimides : synthesis, characterization, and applications , 1984 .
[16] D. W. Burns,et al. A simple technique for the determination of mechanical strain in thin films with applications to polysilicon , 1985 .
[17] Stephen D. Senturia,et al. Automatic generation of a 3-D solid model of a microfabricated structure , 1990, IEEE 4th Technical Digest on Solid-State Sensor and Actuator Workshop.
[18] E. P. EerNisse,et al. Viscous flow of thermal SiO2 , 1977 .
[19] T. F. Retajczyk,et al. Effect of phosphorus doping on stress in silicon and polycrystalline silicon , 1983 .
[20] E. P. EerNisse,et al. Stress in thermal SiO2 during growth , 1979 .
[21] S. Wolf,et al. Silicon Processing for the VLSI Era , 1986 .
[22] William A. Tiller,et al. On the Kinetics of the Thermal Oxidation of Silicon I . A Theoretical Perspective , 1980 .
[23] A. Haghiri-Gosnet,et al. Stresses in sputtered tungsten thin films , 1989 .
[24] R. Howe,et al. Stress in polycrystalline and amorphous silicon thin films , 1983 .
[25] Michael Stonebraker,et al. The design and implementation of INGRES , 1976, TODS.
[26] A. G. Noskov,et al. Correlation between stress and structure in chemically vapour deposited silicon nitride films , 1988 .