Mechanical Properties of Microsensor Materials: How to Deal with the Process Dependences?

[1]  Henry I. Smith,et al.  Low stress tungsten absorber for X-ray masks , 1990 .

[2]  Michael L. Heytens,et al.  GESTALT: an expressive database programming system , 1989, SGMD.

[3]  Minseok Choi,et al.  Stress Effects in Boron‐Implanted Polysilicon Films , 1984 .

[4]  Roger T. Howe,et al.  Polycrystalline and amorphous silicon micromechanical beams: annealing and mechanical properties , 1983 .

[5]  Y. Zhang,et al.  Pressure sensor design and simulation using the CAEMENS-D , 1990, IEEE 4th Technical Digest on Solid-State Sensor and Actuator Workshop.

[6]  D. W. Burns,et al.  Fine-grained polysilicon films with built-in tensile strain , 1988 .

[7]  H. Sunami,et al.  Generation of Dislocations Induced by Chemical Vapor Deposited Si3N4 Films on Silicon , 1972 .

[8]  T. Kamins Structure and Properties of LPCVD Silicon Films , 1980 .

[9]  Eugene A. Irene,et al.  A Viscous Flow Model to Explain the Appearance of High Density Thermal SiO2 at Low Oxidation Temperatures , 1982 .

[10]  D. W. Burns,et al.  Mechanical properties of fine grained polysilicon-the repeatability issue , 1988, IEEE Technical Digest on Solid-State Sensor and Actuator Workshop.

[11]  L. M. Landsberger,et al.  Refractive index, relaxation times and the viscoelastic model in dry‐grown SiO2 films on Si , 1987 .

[12]  George M. Koppelman,et al.  OYSTER, a three-dimensional structural simulator for microelectromechanical design , 1989 .

[13]  C. Goldsmith,et al.  Measurement of stresses generated in cured polyimide films , 1983 .

[14]  Hideo Yoshihara,et al.  Silicon Nitride Single-Layer X-Ray Mask , 1981 .

[15]  K. L. Mittal,et al.  Polyimides : synthesis, characterization, and applications , 1984 .

[16]  D. W. Burns,et al.  A simple technique for the determination of mechanical strain in thin films with applications to polysilicon , 1985 .

[17]  Stephen D. Senturia,et al.  Automatic generation of a 3-D solid model of a microfabricated structure , 1990, IEEE 4th Technical Digest on Solid-State Sensor and Actuator Workshop.

[18]  E. P. EerNisse,et al.  Viscous flow of thermal SiO2 , 1977 .

[19]  T. F. Retajczyk,et al.  Effect of phosphorus doping on stress in silicon and polycrystalline silicon , 1983 .

[20]  E. P. EerNisse,et al.  Stress in thermal SiO2 during growth , 1979 .

[21]  S. Wolf,et al.  Silicon Processing for the VLSI Era , 1986 .

[22]  William A. Tiller,et al.  On the Kinetics of the Thermal Oxidation of Silicon I . A Theoretical Perspective , 1980 .

[23]  A. Haghiri-Gosnet,et al.  Stresses in sputtered tungsten thin films , 1989 .

[24]  R. Howe,et al.  Stress in polycrystalline and amorphous silicon thin films , 1983 .

[25]  Michael Stonebraker,et al.  The design and implementation of INGRES , 1976, TODS.

[26]  A. G. Noskov,et al.  Correlation between stress and structure in chemically vapour deposited silicon nitride films , 1988 .