High repetition rate, wide-aperture KrF lasers for subpicosecond amplification

A high repetition rate, wide-aperture KrF laser with a magnetic switch has been developed. A dynamic response and a core loss of several magnetic materials were measured, resulting in a loss as low as 0.45 J/pulse for a voltage risetime of approximately 100 ns. A maximum output energy of 2.5 J in 20 ns (FWHM) was obtained with a total efficiency of 2.5% at 20 Hz. The cross section of the output beam was 65*50 mm/sup 2/. Spectral, spatial, and temporal profiles of gain and absorption coefficients were also measured, resulting in a peak gain of 8.5%/cm. An output energy of 410 mJ was extracted in 280 fs with two beams by using this laser as an amplifier. >

[1]  S. Watanabe,et al.  High-repetition-rate terawatt excimer laser system with gated gain amplification. , 1990, Optics letters.

[2]  T. R. Gosnell,et al.  High-intensity subpicosecond XeCl laser system. , 1990, Optics letters.

[3]  D. Lo.  The role of halogen donors in discharge instability of rare-gas halide excimer lasers , 1989 .

[4]  Robert Fedosejevs,et al.  Measurements of gain and absorption saturation in an electron-beam-pumped KrF amplifier , 1989 .

[5]  R. Muller,et al.  Excimer Lasers With Large Discharge Cross Section , 1989, Other Conferences.

[6]  Rod S. Taylor,et al.  Ultralong optical‐pulse corona preionized XeCl laser , 1989 .

[7]  Shinichi Watanabe,et al.  Multiterawatt Excimer Laser System , 1989, Short Wavelength Coherent Radiation: Generation and Applications.

[8]  S. Watanabe,et al.  Terawatt XeCl discharge laser system. , 1988, Optics letters.

[9]  S. Itoh,et al.  High-average-150-W power 700-Hz high-repetition-rate KrF excimer laser , 1988 .

[10]  M. Osborne,et al.  Rare-gas-halide discharge stability , 1988 .

[11]  F. Schäfer,et al.  Comparative study of the gain dynamics of XeCl and KrF with subpicosecond resolution , 1987 .

[12]  F. Schäfer,et al.  Hybrid dye-excimer laser system for the generation of 80 fs, 900 GW pulses at 248 nm , 1987 .

[13]  I. McIntyre,et al.  Dynamic absorption effects in KrF* amplifiers , 1987 .

[14]  A. Endoh,et al.  High repetition long pulse XeCl laser with a coaxial ceramic pulse-forming line , 1986 .

[15]  R. Taylor,et al.  Preionization and discharge stability study of long optical pulse duration UV-preionized XeCl lasers , 1986 .

[16]  I. McDermid,et al.  Ultranarrow linewidth, magnetically switched, long pulse, xenon chloride laser , 1984 .

[17]  Shinichi Watanabe,et al.  An electrically triggered 200 kV rail‐gap switch for wide aperture excimer lasers , 1984 .

[18]  K. Midorikawa,et al.  X-ray preionization of rare-gas-halide lasers , 1984, IEEE Journal of Quantum Electronics.

[19]  William H. Long,et al.  Efficient discharge pumping of an XeCl laser using a high‐voltage prepulse , 1983 .

[20]  A. Alcock,et al.  Preionization kinetics of an X-ray preionized XeCl gas discharge laser , 1983 .

[21]  P. Corkum,et al.  Time-dependent gain and absorption in a 5 J UV preionized XeCl laser , 1983 .

[22]  A. Endoh,et al.  Wide aperture self‐sustained discharge KrF and XeCl lasers , 1982 .

[23]  Paul B. Corkum,et al.  Picosecond amplification and kinetic studies of XeCl , 1982 .

[24]  G. Tisone,et al.  Study of the XeCl laser pumped by a high-intensity electron beam , 1982 .

[25]  W. C. Nunnally,et al.  Magnetic switches and circuits , 1982 .

[26]  S. Byron,et al.  Electrical excitation of an XeCl laser using magnetic pulse compression , 1982 .

[27]  A. Alcock,et al.  Spatially resolved gain measurements in UV preionized homogenous discharge XeCl and KrF lasers , 1981 .

[28]  J. Levatter,et al.  X‐ray preionization for electric discharge lasers , 1979 .

[29]  C. Brau,et al.  Theoretical studies of UV-preionized transverse discharge KrF and ArF lasers , 1978 .

[30]  R. Sze,et al.  Experimental studies of a KrF and ArF discharge laser , 1978 .

[31]  A. Alcock,et al.  Parametric study of a constant E/N pumped high-power KrF* laser , 1978 .

[32]  K. Butterfield,et al.  Spectral tuning of ArF and KrF discharge lasers , 1978 .

[33]  A. Hawryluk,et al.  Gain and absorption measurements in a KrF* laser , 1977 .

[34]  T. Chang,et al.  Improved Uniform‐Field Electrode Profiles for TEA Laser and High‐Voltage Applications , 1973 .