Application of neural fuzzy network to pyrometer correction and temperature control in rapid thermal processing

Temperature measurement and control are two difficult problems in the rapid thermal processing (RTP) system. For many applications such as rapid thermal processing chemical vapor deposition (RTCVD) and rapid thermal oxidation (RTO), large changes in wafer emissivity can occur during film growing, leading to erroneous temperature measurements with a single wavelength pyrometer. The error in the inferred temperature will affect the temperature control of the RTP system. In order to correct the temperature reading of the pyrometer, a neural fuzzy network is used to predict the emissivity changes for the compensation of measured temperature. As for the temperature control, to overcome ill performance of the temperature tracking system due to the inaccuracy of the identified model, another neural fuzzy network is used in the RTP system for learning inverse control simultaneously. The key advantage of neural fuzzy approach over traditional ones lies on that the approach does not require a mathematical description of the system while performing pyrometer correction and temperature control. Simulation results show that the adopted neural fuzzy networks can not only correct the pyrometer reading accurately, but also be able to track a temperature trajectory very well.

[1]  H. A. Lord,et al.  Thermal And Stress Analysis Of Semiconductor Wafers In A Rapid Thermal Processing Oven , 1988, Other Conferences.

[2]  Tsutomu Satō,et al.  Spectral Emissivity of Silicon , 1967 .

[3]  S. A. Norman Optimization of transient temperature uniformity in RTP systems , 1992 .

[4]  S. Yu,et al.  Temperature control strategies for RTP systems , 1993, [1993] Proceedings of the Tenth Biennial University/Government/Industry Microelectronics Symposium.

[5]  F.-C. Chen,et al.  Back-propagation neural networks for nonlinear self-tuning adaptive control , 1990, IEEE Control Systems Magazine.

[6]  Michio Sugeno,et al.  Fuzzy identification of systems and its applications to modeling and control , 1985, IEEE Transactions on Systems, Man, and Cybernetics.

[7]  F. Y. Sorrell,et al.  Temperature Uniformity In RTP Furnaces , 1990, Other Conferences.

[8]  A. Sideris,et al.  A multilayered neural network controller , 1988, IEEE Control Systems Magazine.

[9]  D. T. Grider,et al.  Low-Pressure Chemical Vapor Deposition of Polycrystalline Silicon and Silicon Dioxide By Rapid Thermal Processing , 1989 .

[10]  Mehmet C. Öztürk,et al.  Temperature uniformity in RTP furnaces , 1992 .

[11]  Mehrdad M. Moslehi,et al.  Modeling, Identification, and Control of Rapid Thermal Processing Systems , 1994 .

[12]  A. Gat,et al.  The Effect of Thin Dielectric Films on the Accuracy of Pyrometric Temperature Measurement , 1985 .

[13]  Emil Wolf,et al.  Principles of Optics: Contents , 1999 .

[14]  F. Yates Sorrell,et al.  Applied RTP optical modeling: an argument for model-based control , 1994 .

[15]  V. M. Donnelly,et al.  Infrared‐laser interferometric thermometry: A nonintrusive technique for measuring semiconductor wafer temperatures , 1990 .

[16]  Charles D. Schaper,et al.  Rapid thermal multiprocessing for a programmable factory for adaptable manufacturing of ICs , 1994 .

[17]  Model-based emissivity correction in pyrometer temperature control of rapid thermal processing systems , 1993 .

[18]  T. Kailath,et al.  Model identification in rapid thermal processing systems , 1993 .

[19]  Chin-Teng Lin,et al.  Temperature control of rapid thermal processing system using adaptive fuzzy network , 1999, Fuzzy Sets Syst..

[20]  Karen Maex,et al.  Temperature Non-Uniformities During Rapid Thermal Processing Of Patterned Wafers , 1990, Other Conferences.

[21]  C. S. George Lee,et al.  Neural fuzzy systems: a neuro-fuzzy synergism to intelligent systems , 1996 .

[22]  Hisham Z. Massoud,et al.  Manufacturability of rapid-thermal oxidation of silicon: oxide thickness, oxide thickness variation, and system dependency , 1992 .

[23]  P. Timans The Role of Thermal Radiative Properties of Semiconductor Wafers in Rapid Thermal Processing , 1996 .

[24]  Karen Maex,et al.  Influence of temperature and backside roughness on the emissivity of Si wafers during rapid thermal processing , 1992 .

[25]  J. M. Stone,et al.  Radiation and Optics , 1963 .

[26]  J.P. Krusius,et al.  Rapid thermal processing of thin gate dielectrics. Oxidation of silicon , 1985, IEEE Electron Device Letters.

[27]  In-Situ Processing of Silicon Dielectrics by Rapid Thermal Processing: Cleaning, Growth, and Annealing , 1987 .

[28]  Fred Roozeboom,et al.  Rapid thermal processing systems: A review with emphasis on temperature control , 1990 .

[29]  Chin-Teng Lin,et al.  Neural-Network-Based Fuzzy Logic Control and Decision System , 1991, IEEE Trans. Computers.

[30]  Dim-Lee Kwong,et al.  Systems-oriented survey of noncontact temperature measurement techniques for rapid thermal processing , 1991, Other Conferences.

[31]  Chin-Teng Lin,et al.  An online self-constructing neural fuzzy inference network and its applications , 1998, IEEE Trans. Fuzzy Syst..

[32]  J. Gelpey,et al.  Process Control for a Rapid Optical Annealing System , 1985 .

[33]  A. S. Grove,et al.  General Relationship for the Thermal Oxidation of Silicon , 1965 .

[34]  C. Hill,et al.  Rapid Thermal Annealing - Theory and Practice , 1989 .