Fabrication of microchannel arrays in borophosphosilicate glass

Two-dimensional arrays of embedded channels with cross-sectional diameters of 1–3 μm were fabricated in silica-on-silicon thin film structures. The channel arrays were fabricated using void-forming borophosphosilcate glass (BPSG) deposited by plasma-enhanced chemical vapor deposition (PECVD) over templates patterned and etched using standard photolithographic methods and reactive ion etching. The sizeand shape of the channels could be controlled by adjusting the depth, width, and spacing of the template ridges, the dopant levels in the BPSG, and the annealing conditions. Optimization of the channel fabrication process through detailed investigation of the process variables is presented. Potential applications inphotonics, sensors, and microfluidics are discussed.

[1]  Jean-Michel Lourtioz,et al.  Fabrication of 2-D and 3-D silicon photonic crystals by deep etching , 2002 .

[2]  Jiangtao Cheng,et al.  Microfluid mechanics: progress and opportunities , 2001 .

[3]  M. Kirchhoff,et al.  Application of borophosphosilicate glass (BPSG) in microelectronic processing , 1996 .

[4]  N. Morimoto,et al.  Deposition of thick TEOS PECVD silicon oxide layers for integrated optical waveguide applications , 1998 .

[5]  R. Conti,et al.  High Aspect Ratio Trench Filling Using Two‐Step Subatmospheric Chemical Vapor Deposited Borophosphosilicate Glass for <0.18 μm Device Application , 1999 .

[6]  B. Nguyen,et al.  Gap Fill and Film Reflow Capability of Subatmospheric Chemical Vapor Deposited Borophosphosilicate Glass , 1996 .

[7]  Andreu Llobera,et al.  Mechanical properties of PECVD silicon oxide films suitable for integrated optics applications , 2000, Photonics West - Optoelectronic Materials and Devices.

[8]  Satish G. Kandlikar,et al.  Evolution of Microchannel Flow Passages--Thermohydraulic Performance and Fabrication Technology , 2003 .

[9]  Carlos Domínguez,et al.  Plasma enhanced CVD silicon oxide films for integrated optic applications , 1999 .

[10]  P. Dumais,et al.  Silica-on-silicon optical sensor based on integrated waveguides and microchannels , 2005, IEEE Photonics Technology Letters.

[11]  Peter Ingo Borel,et al.  Advances in silica-based integrated optics , 2003 .

[12]  E. Guiot,et al.  Ultralow Loss High Delta Silica Germania Planar Waveguides , 2004 .

[13]  Tibor Chován,et al.  Microfabricated devices in biotechnology and biochemical processing. , 2002, Trends in biotechnology.

[14]  Haiyan Ou,et al.  Different index contrast silica-on-silicon waveguides by PECVD , 2003 .

[15]  W. R. Runyan,et al.  Semiconductor integrated circuit processing technology , 1990 .

[16]  F. Becker,et al.  Low pressure deposition of doped SiO2 by pyrolysis of tetraethylorthosilicate (TEOS). I: Boron and phosphorus doped films , 1987 .