Monitoring of optical coatings.

Monitoring implies the measurement and control of the parameters of optical thin films during deposition with the object of ensuring the production of an acceptable coating. Monitoring techniques usually concentrate on film thickness as the most important parameter. The principal monitoring arrangements in current use are surveyed with a brief account of their relative merits. It is shown that they are less able to cope with refractive-index errors than with simple thickness errors and that tight control of material parameters is required to take advantage of recent advances in monitoring techniques.

[1]  B. Vidal,et al.  Nonquarterwave multilayer filters: optical monitoring with a minicomputer allowing correction of thickness errors. , 1979, Applied optics.

[2]  H. A. Macleod,et al.  Turning Value Monitoring of Narrow-band All-dielectric Thin-film Optical Filters , 1972 .

[3]  M BANNING,et al.  Practical methods of making and using multilayer filters. , 1947, Journal of the Optical Society of America.

[4]  J A Dobrowolski,et al.  Optical thin film synthesis program based on the use of Fourier transforms. , 1978, Applied optics.

[5]  R. O'handley,et al.  A modulated ellipsometer for studying thin film optical properties and surface dynamics , 1973 .

[6]  4.2 Monitoring of optical thin films using a quartz crystal monitor , 1977 .

[7]  J. Vincent.  Contribution à l'étude de l'intensité des raies et bandes d'absorption dans l'infrarouge , 1951 .

[8]  P. Lissberger,et al.  Improved Methods for Producing Interference Filters , 1955 .

[9]  C. Holm,et al.  Optical thin film production with continuous reoptimization of layer thicknesses. , 1979, Applied optics.

[10]  H. Macleod.  4.1 The monitoring of thin films for optical purposes , 1977 .

[11]  H. Pulker,et al.  Refractive indices of TiO(2) films produced by reactive evaporation of various titanium-oxygen phases. , 1976, Applied optics.

[12]  E. Pelletier,et al.  Influence du Procédé de Contrôle Sur Les Tolérances de Réalisation des Filtres Interférentiels à Bande Etroite , 1973 .

[13]  H. A. Macleod,et al.  Error Compensation Mechanisms in Some Thin-film Monitoring Systems , 1977 .

[14]  R. Kowalczyk,et al.  Optical filters: Monitoring process allowing the auto-correction of thickness errors , 1972 .

[15]  Harry D. Polster,et al.  A symmetrical all-dielectric interference filter , 1952 .

[16]  T. Christmas,et al.  The durability and stability of evaporated thin film filters , 1977 .

[17]  E Pelletier,et al.  Optical monitoring of nonquarterwave multilayer filters. , 1978, Applied optics.

[18]  E Pelletier,et al.  Wideband optical monitoring of nonquarterwave multilayer filters. , 1979, Applied optics.