Novolac-Based photoresists combining chemical amplification and dissolution inhibition

This paper concerns a more in-depth examination of the different components which make up positive photoresists based on the combined principles of chemical amplification and dissolution inhibition. Included is a discussion of the requirements for materials to be used as dissolution inhibitors in this scheme as well as an example of an optimum compound-t-butyl-cholate. Also considered are the effects of onium salt counteranions on resist performance including gel permeation chromatographic (GPC) analyses of the changes in novolac molecular weight distribution which can occur during irradiation and postbake.