Dependence of conduction mechanisms in heavily Al-doped 4H-SiC epilayers on Al concentration
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K. Kojima | H. Okumura | Tomohisa Kato | S. Ji | H. Matsuura | Atsuki Hidaka | K. Eto | Akinobu Takeshita | T. Imamura | Kota Takano | Kazuya Okuda | S. Yoshida | Hideharu Matsuura