Plasma Processing of Semiconductors

Preface. Plasma Etching: Introduction to Plasma Etching T.D. Mantei. Plasma Chemistry, Basic Processes and PECVD D.L. Flamm. The Role of Ions in Reactive Ion Etching with Low Density Plasmas J.W. Coburn. SiO2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas G.S. Oehrlein. Plasma Deposition: Introduction to Plasma Enhanced Chemical Vapor Deposition T.S. Cale, et al. Topography Evolution During Semiconductor Processing T.S. Cale, et al. Deposition of Amorphous Silicon J. Perrin. Plasma Sources: High Density Sources for Plasma Etching T.D. Mantei. Resonant Plasma Excitation by Electron Cyclotron Waves - Fundamentals and Applications H. Oechsner. The Transition from Capacitive to Inductive to Wave Sustained Discharges R.W. Boswell, et al. Physics of Surface-Wave Discharges J. Margot, M. Moisan. Plasma-Surface Interactions: Surface Science Aspects of Etching and Wall Reactions in High Density Plasmas J.W. Coburn. Plasma-Surface Interactions R. d'Agostino. Cl2 Plasma-Si Surface Interactions in Plasma Etching V.M. Donnelly, et al. Numerical Modeling: Particle in Cell Monte Carlo Collision Codes (PIC-MCC), Methods and Applications to Plasma Processing J.-P. Boeuf, A. Merad. Plasma Diagnostics: Optical Diagnostics of Processing Plasmas P.F. Williams. Optical Diagnostics of Plasmas: A Tool for Process Control N. Sadeghi, et al. Infrared Absorption Spectroscopy as a Diagnostic for Processing Plasmas G.M.W. Kroesen. Ellipsometric Analysis of Plasma Deposited and Plasma Etched Materials J.A. Woollam. Mass Spectrometry of Reactive Plasmas J. Perrin. Less Conventional Processing Applications of Plasmas: Deposition of Silicon Dioxide Films Using the Helicon Diffusion Reactor for Integrated Optics Applications R.W. Boswell, et al. Remote Plasma Processing G.S. Oehrlein. Magnetized Surface-Wave Discharges for Submicrometer Pattern Transfer J. Margot, et al. Dusty Plasmas: Fundamental Aspects and Industrial Applications G.M.W. Kroesen. Industrial Application of Plasmas for Processing: Low Energy Plasma Beams for Semiconductor Technology H. Oechsner. Process Control Concepts S. Watts Butler. Issues and Solutions for Applying process Control to Semiconductor Manufacturing S. Watts Butler. Index.