Spatial yield modeling for semiconductor wafers

The distribution of good and bad chips on a semiconductor wafer typically results in two types of regions, one that contains both good and bad chips distributed in a random fashion, called a "non-zero yield region", and the other that contains almost all bad chips, called a "zero yield region". The yield of a non-zero yield region is modeled by well understood expressions derived from Poisson or negative binomial statistics. To account for yield loss associated with zero yield regions, the yield expression for non-zero yield regions is multiplied by Y/sub 0/, the fraction of the wafer occupied by non-zero yield regions. The presence, extent, and nature of zero yield regions on a given wafer provide information about yield loss mechanisms responsible for causing them. Two statistical methods are developed to detect the presence of zero yield regions and calculate Y/sub 0/ for a given wafer. These methods are based on a set-theoretic image analysis tool, called the Aura Framework, and on hypothesis testing on nearest neighbors of bad chips. Results show that the modeling of the distribution of good and bad chips on wafers in terms of zero and non-zero yield regions is highly accurate. The detection of zero yield regions provides improved insight into the yield loss mechanisms. Also, the ability to calculate Y/sub 0/ enables better evaluation of the yield models used to predict the yield of non-zero yield regions.

[1]  K. Kafadar,et al.  Testing for homogeneity of two-dimensional surfaces , 1983 .

[2]  Anil K. Jain,et al.  Algorithms for Clustering Data , 1988 .

[3]  B. T. Murphy,et al.  Cost-size optima of monolithic integrated circuits , 1964 .

[4]  Albert V. Ferris-Prabhu,et al.  Introduction To Semiconductor Device Yield Modeling , 1992 .

[5]  Ibrahim M. Elfadel,et al.  Gibbs Random Fields, Cooccurrences, and Texture Modeling , 1994, IEEE Trans. Pattern Anal. Mach. Intell..

[6]  C. W. Therrien,et al.  Decision, Estimation and Classification: An Introduction to Pattern Recognition and Related Topics , 1989 .

[7]  O. Paz,et al.  Modification of Poisson statistics: modeling defects induced by diffusion , 1977 .

[8]  Rosalind W. Picard,et al.  Texture modeling: temperature effects on markov/gibbs random fields , 1991 .

[9]  J. A. Cunningham The use and evaluation of yield models in integrated circuit manufacturing , 1990 .

[10]  Donald Geman,et al.  Bayes Smoothing Algorithms for Segmentation of Binary Images Modeled by Markov Random Fields , 1984, IEEE Transactions on Pattern Analysis and Machine Intelligence.

[11]  C. H. Stapper,et al.  Fact and fiction in yield modeling , 1989 .

[12]  Jose Pineda de Gyvez Integrated circuit defect-sensitivity - theory and computational models , 1993, The Kluwer international series in engineering and computer science.

[13]  Donald Geman,et al.  Stochastic Relaxation, Gibbs Distributions, and the Bayesian Restoration of Images , 1984, IEEE Transactions on Pattern Analysis and Machine Intelligence.

[14]  Ibrahim M. Elfadel,et al.  Miscibility matrices explain the behavior of gray-scale textures generated by Gibbs random fields , 1991, Other Conferences.

[15]  Virginia F. Flack Introducing dependency into IC yield models , 1985 .

[16]  Andrzej J. Strojwas,et al.  VLSI Yield Prediction and Estimation: A Unified Framework , 1986, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.

[17]  C.H. Stapper,et al.  Integrated circuit yield statistics , 1983, Proceedings of the IEEE.

[18]  Charles H. Stapper,et al.  LSI Yield Modeling and Process Monitoring , 1976, IBM J. Res. Dev..

[19]  M. Bartlett The statistical analysis of spatial pattern , 1974, Advances in Applied Probability.

[20]  A. V. Ferris-Prabhu,et al.  Modeling the critical area in yield forecasts , 1985 .

[21]  J. Besag Spatial Interaction and the Statistical Analysis of Lattice Systems , 1974 .