Nanolithography: Status and challenges
暂无分享,去创建一个
[1] Jae Won Jeong,et al. Highly tunable self-assembled nanostructures from a poly(2-vinylpyridine-b-dimethylsiloxane) block copolymer. , 2011, Nano letters.
[2] Bong Hoon Kim,et al. Flexible and Transferrable Self‐Assembled Nanopatterning on Chemically Modified Graphene , 2013, Advanced materials.
[3] Seiji Morita,et al. Sub-15nm patterning technology using directed self-assembly on nano-imprinting guide , 2016, SPIE Advanced Lithography.
[4] Shufeng Bai,et al. Wafer-scale patterning of sub-40 nm diameter and high aspect ratio (>50:1) silicon pillar arrays by nanoimprint and etching , 2008, Nanotechnology.
[5] Makoto Muramatsu,et al. Pattern fidelity improvement of chemo-epitaxy DSA process for high-volume manufacturing , 2016, SPIE Advanced Lithography.
[6] Joy Y. Cheng,et al. Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist. , 2010, ACS nano.
[7] Khairudin Mohamed,et al. A review of roll-to-roll nanoimprint lithography , 2014, Nanoscale Research Letters.
[8] Ted Liang,et al. EUV progress toward HVM readiness , 2016, SPIE Advanced Lithography.
[9] Jin Ok Hwang,et al. Surface energy modification by spin-cast, large-area graphene film for block copolymer lithography. , 2010, ACS nano.
[10] Michael C. Smayling. Lithography alternatives meet design style reality: How do they "line" up? , 2016, SPIE Advanced Lithography.
[11] Juan J. de Pablo,et al. Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features , 2013 .
[12] Dominic Ashworth,et al. SEMATECH's cycles of learning test for EUV photoresist and its applications for process improvement , 2014, Advanced Lithography.
[13] Hideaki Tsubaki,et al. Negative-tone imaging with EUV exposure toward 13nm hp , 2016, SPIE Advanced Lithography.
[14] Hengpeng Wu,et al. Patterning sub-25nm half-pitch hexagonal arrays of contact holes with chemo-epitaxial DSA guided by ArFi pre-patterns , 2015, Advanced Lithography.
[15] Ted Prescop,et al. E-beam direct write (EBDW) as complementary lithography , 2010, Photomask Technology.
[16] Masayuki Hatano,et al. NIL defect performance toward high volume mass production , 2016, SPIE Advanced Lithography.
[17] David Z. Pan,et al. Pushing multiple patterning in sub-10nm: Are we ready? , 2015, 2015 52nd ACM/EDAC/IEEE Design Automation Conference (DAC).
[18] S. Kim,et al. Ultralarge-area block copolymer lithographyvia soft graphoepitaxy , 2011 .
[19] Bong Hoon Kim,et al. Block copolymer multiple patterning integrated with conventional ArF lithography , 2010 .
[20] Mark Bremer,et al. Fabrication of EUVL micro-field exposure tools with 0.5 NA , 2015, SPIE Optifab.
[21] K. Kemp. The future of EUV lithography , 2003 .
[22] Koichi Fujiwara. Novel EUV resist development for sub-14 nm half pitch , 2017, 2017 China Semiconductor Technology International Conference (CSTIC).
[23] P. Biagioni,et al. Nanoantennas for visible and infrared radiation , 2011, Reports on progress in physics. Physical Society.
[24] Judon Stoeldraijer,et al. EUV lithography performance for manufacturing: status and outlook , 2016, SPIE Advanced Lithography.
[25] Gijsbert Rispens,et al. Novel High Sensitivity EUV Photoresist for Sub-7 nm Node , 2016 .
[26] Kee-Bong Choi,et al. Nano-scale patterning using the roll typed UV-nanoimprint lithography tool , 2008 .
[27] Jan Mulkens,et al. Overlay and edge placement control strategies for the 7nm node using EUV and ArF lithography , 2015, Advanced Lithography.
[28] Geert Vandenberghe,et al. Novel metal containing resists for EUV lithography extendibility , 2016, SPIE Advanced Lithography.
[29] T. Veres,et al. Fabrication of large area nanoprism arrays and their application for surface enhanced Raman spectroscopy , 2008, Nanotechnology.
[30] Hiromi Hiura,et al. Nanoimprint system development and status for high volume semiconductor manufacturing , 2016, European Mask and Lithography Conference.
[31] Christopher K. Ober,et al. Recent progress in nanoparticle photoresists development for EUV lithography , 2016, SPIE Advanced Lithography.
[32] L. Guo,et al. Large-area roll-to-roll and roll-to-plate nanoimprint lithography: a step toward high-throughput application of continuous nanoimprinting. , 2009, ACS nano.
[33] Warren Montgomery,et al. The patterning center of excellence (CoE): an evolving lithographic enablement model , 2015, Advanced Lithography.
[34] Jian Yin,et al. The SMARTTM Process for Directed Block Co-Polymer Self-Assembly , 2013 .
[35] Gijsbert Rispens,et al. Novel high sensitivity EUV photoresist for sub-7nm node , 2016, SPIE Advanced Lithography.
[36] Hideaki Tsubaki,et al. Negative-tone Imaging with EUV Exposure toward 13 nm hp , 2016 .
[37] Bong Hoon Kim,et al. Large-area, highly oriented lamellar block copolymer nanopatterning directed by graphoepitaxially assembled cylinder nanopatterns , 2012 .
[38] Hiroshi Goto,et al. Prototype development of a roller imprint system and its application to large area polymer replication for a microstructured optical device , 2008 .
[39] C. Wagner,et al. EUV lithography: Lithography gets extreme , 2010 .
[40] Burn Jeng Lin. Optical lithography with and without NGL for single-digit nanometer nodes , 2015, Advanced Lithography.
[41] Makoto Nakajima,et al. Approach to hp10nm resolution by applying Dry Development Rinse Process (DDRP) and Materials (DDRM) , 2016, SPIE Advanced Lithography.
[42] K. Berggren,et al. A path to ultranarrow patterns using self-assembled lithography. , 2010, Nano letters.
[43] Ramakrishnan Ayothi,et al. Novel EUV Resist development for Sub-14nm Half Pitch , 2015 .
[44] Toshiro Itani,et al. Novel ultra-high sensitive 'metal resist' for EUV lithography , 2016, SPIE Advanced Lithography.
[45] Elmar Platzgummer,et al. Electron multi-beam technology for mask and wafer writing at 0.1nm address grid , 2013, Advanced Lithography.
[46] William A. Barletta,et al. Considerations for a free-electron laser-based extreme-ultraviolet lithography program , 2015, Advanced Lithography.
[47] Mark Neisser,et al. ITRS lithography roadmap: 2015 challenges , 2015 .
[48] Yasin Ekinci,et al. Chapter 4 - EUV lithography process challenges , 2016 .
[49] Tsuyoshi Yamada,et al. Performance of new high-power HVM LPP-EUV source , 2016, SPIE Advanced Lithography.