Body-biasing assisted vmin optimization for 5nm-node multi-Vt FD-SOI 6T-SRAM
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This work proposes a body-biasing technique to optimize Vmin of the 6T-SRAM based on 5nm-node multi-Vt FD-SOI devices. Accounting for the process variation, the operating voltage, Vmin, is estimated at 6-sigma yield. By properly selecting the back bias, the lowest Vmin is achieved for each of the three operation modes: high-performance, standard and low-voltage modes. In high-performance mode, the optimized Vmin is reduced to 0.491 V at back bias of 0.2 V. The proposed technique offers a design flexibility for optimizing the SRAM performance and yield by adjusting the back bias without complicated process technology requirements.
[1] Andrew Evert Carlson. Device and circuit techniques for reducing variation in nanoscale SRAM , 2008 .
[2] E. Seevinck,et al. Static-noise margin analysis of MOS SRAM cells , 1987 .
[3] Tsu-Jae King Liu,et al. Advanced MOSFET Designs and Implications for SRAM Scaling Changhwan , 2011 .
[4] Hyung-Kyu Lim,et al. Threshold voltage of thin-film Silicon-on-insulator (SOI) MOSFET's , 1983, IEEE Transactions on Electron Devices.